Tipsa dina vänner om produkten:
Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices Young-Hee Kim
Har du en profil? Logga in
Få avisering om nya utgåvor med Young-Hee Kim
Lägg till din iMusic-önskelista
eller
Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices
Young-Hee Kim
Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. The origin of soft breakdown (first breakdown) was studied and the results suggested that the soft breakdown may be due to one layer breakdown in the bilayer structure (HfO2/SiO2: 4 nm/4 nm).
92 pages, X, 92 p.
| Media | Böcker Pocketbok (Bok med mjukt omslag och limmad rygg) |
| Releasedatum | 31 december 2007 |
| ISBN13 | 9783031014246 |
| Utgivare | Springer International Publishing AG |
| Antal sidor | 92 |
| Mått | 234 × 191 × 13 mm · 220 g |
| Språk | Engelska |
Fler produkter med Young-Hee Kim
Visa allaMer från samma **utgivare**
Se alt med Young-Hee Kim ( t.ex. Pocketbok )