Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier R - Cheng - Böcker - Springer Verlag, Singapore - 9789811061646 - 18 september 2017
Om omslag och titel inte matchar är det titeln som gäller

Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier R 1st ed. 2018 edition

Cheng

Julklappar kan bytas fram till 31:e januari
Lägg till din iMusic-önskelista

Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier R 1st ed. 2018 edition

This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP) for integrated circuits using ruthenium (Ru) as a novel barrier layer material.


137 pages, 103 Illustrations, black and white; XVIII, 137 p. 103 illus.

Media Böcker     Bok
Releasedatum 18 september 2017
ISBN13 9789811061646
Utgivare Springer Verlag, Singapore
Antal sidor 137
Mått 399 g

Visa alla

Fler produkter med Cheng

Se alt med Cheng ( t.ex. Bok , Inbunden Bok , CD och Pocketbok )